[18p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

[18p-E14-20] Deposition of thin Si, Ge, and SiGe films using nanocryatalline silicon ballistic electron emitter

^○Ryutaro Suda¹, Mamiko Yagi¹, Akira Kojima¹, Mentek Romain¹, Jun-ichi Shirakashi¹, Nobuyoshi Koshida¹ (Graduate School of Eng., Tokyo Univ. of Agri. & Technol.¹)

Keywords:電子源,薄膜堆積,還元