The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

15. Crystal Engineering » 15.6 IV-group-based compounds

[18p-E5-1~11] 15.6 IV-group-based compounds

Tue. Mar 18, 2014 1:15 PM - 4:15 PM E5 (E105)

3:00 PM - 3:15 PM

[18p-E5-7] Relaxation behavior of threshold voltage shift under gate bias stress and suggestion of advanced measurement method

Mitsuru Sometani1, Dai Okamoto1, Shinsuke Harada1, Hitoshi Ishimori1, Shinji Takasu1, Tetsuo Hatakeyama1, Manabu Takei2, Kazutoshi Kojima1, Yoshiyuki Yonezawa1, Kenji Fukuda1, hajime Okumura1 (AIST ADPERC1, Fuji Electric2)

Keywords:SiC,信頼性,しきい値電圧