3:00 PM - 3:15 PM
[18p-F11-8] Gate length reduction via self-aligned source/drain stacks in the InAs nanowire FET
Keywords:ナノワイヤ,InAs,FET
Oral presentation
09. Applied Materials Science » 9.2 Nanowires, nanoparticles
Tue. Mar 18, 2014 1:00 PM - 5:45 PM F11 (F407)
3:00 PM - 3:15 PM
Keywords:ナノワイヤ,InAs,FET