[18p-F2-1~13] 7.3 Lithography

[18p-F2-12] Active-Matrix nc-Si Electron Emitter Array for Massively Parallel Direct-Write EB System (IV)

^○Naokatsu Ikegami¹, Akira Kojima^1,3, Takashi Yoshida², Hitoshi Nishino², Shinya Yoshida², Hiroshi Miyaguchi², Masanori Muroyama², Hideyuki Ohyi³, Nobuyoshi Koshida¹, Masayoshi Esashi² (Tokyo Univ. of Agri. & Tech.¹, Tohoku Univ.², CRESTEC³)

Keywords:EB Lithography,電子エミッタ,ナノ結晶シリコン