[18p-F3-1~19] 7.4 Nanoimprint

[18p-F3-14] Study of Antisticking Layer Deterioration Mechanism on Repeated UV nanoimprint

^○Shuso Iyoshi^1,2, Makoto Okada^1,2, Yuichi Haruyama^1,2, Masaru Nakagawa^2,3, Hiroshi Hiroshima^2,4, Shinji Matsui^1,2 (Univ. of Hyogo¹, JST-CREST², Tohoku Univ.³, AIST⁴)

Keywords:UVナノインプリント,離型