[18p-PA7-1~2] 8.4 Plasma etching

[18p-PA7-1] Surface analysis of n-GaN crystal damaged by UV assisted He plasma-etching

^○Masahito Niibe¹, Shodai Hirai¹, Retsuo Kawakami², Tatsuo Shirahama², Yoshitaka Nakano³, Takashi Mukai⁴ (Univ. Hyogo¹, Univ. Tokushima², Chubu Univ.³, Nichia Corp.⁴)

Keywords:Heプラズマ,Ultraviolet,GaN