The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[19p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

Wed. Mar 19, 2014 1:15 PM - 6:45 PM E14 (E302)

4:15 PM - 4:30 PM

[19p-E14-12] Electric properties of thermal oxide formed by minimal resistance furnace

Katsuhiko Nakato1, hitoshi Asano1, Sinnosuke Suzuki1,3, Shogo Matsuda1,3, Ayami Yaginuma1,3, Kiyohiko Morikawa1,3, Masashi Hattori1,3, Takanori Mikahara1, Shinichi Ikeda1,2, Sommawan Khumpuang1,2, Shiro Hara1,2 (MINIMAL1, AIST2, KOYO Thermo System Co.,Ltd3)

Keywords:ミニマル