The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.4 Devices/Integration Technologies

[19p-F12-1~20] 13.4 Devices/Integration Technologies

Wed. Mar 19, 2014 1:30 PM - 6:45 PM F12 (F408)

2:45 PM - 3:00 PM

[19p-F12-6] Fabrication and characterization of Si quantum dots using SF6 dry etching technique

○Yi Lu1, Tetsuo Kodera1,2,3, Kousuke Horibe1, Shunri Oda1 (QNERC, Tokyo Tech.1, NanoQuine, Univ. of Tokyo2, JST-PRESTO3)

Keywords:量子ドット