[19p-F6-1~18] 8.4 Plasma etching

[19p-F6-11] Etching reactions for Si, SiO2 and SiN by SiBrx ions

^○kazuhiro karahashi¹, yu muraki¹, hu li¹, masaaki matsukuma², satoshi hamaguchi¹ (Osaka Univ.¹, Tokyo Electron Ltd.²)

Keywords:エッチング生成物,HBｒ