The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-F6-1~18] 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

3:15 PM - 3:30 PM

[19p-F6-6] Instantaneous generation of many flaked particles in mass-production plasma etching equipment

Yuji Kasashima1, Taisei Motomura1, Natsuko Nabeoka1, Fumihiko Uesugi1 (AIST1)

Keywords:剥離パーティクル,電場応力,撃力