The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-F6-1~18] 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

4:00 PM - 4:15 PM

[19p-F6-8] Mechanism of Surface Roughness of ArF Photoresist During HBr Plasma Etching Processes (2)

○(M1)Yan Zhang1, Kenji Ishikawa1, Keigo Takeda1, Hiroki Kondo1, Makoto Sekine1, Masaru Hori1 (Nagoya Univ.1)

Keywords:roughness,Power Spectral Density,plasma cure