The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[19p-F6-1~18] 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

4:15 PM - 4:30 PM

[19p-F6-9] A Study on Annealing Mechanism of Plasma-induced Si Substrate Damage (1)

Koji Eriguchi1, Masanaga Fukasawa2, Yoshinori Takao1, Tetsuya Tatsumi2, Kouichi Ono1 (Kyoto Univ.1, Sony Corp.2)

Keywords:プラズマダメージ,熱処理,欠陥