Mechanism of Surface Roughness of ArF Photoresist During HBr Plasma Etching Processes (2)

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Wed. Mar 19, 2014 2:00 PM - 7:00 PM F6 (F306)

4:00 PM - 4:15 PM

^○（M1）Yan Zhang¹, Kenji Ishikawa¹, Keigo Takeda¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹)

Keywords:roughness,Power Spectral Density,plasma cure