[19p-F6-1~18] 8.4 プラズマエッチング

▼ [19p-F6-8] Mechanism of Surface Roughness of ArF Photoresist During HBr Plasma Etching Processes (2)

^○（M1）張彦，石川健治，竹田圭吾，近藤博基，関根誠，堀勝 (Nagoya Univ.)

キーワード：roughness,Power Spectral Density,plasma cure