[19p-F6-1~18] 8.4 Plasma etching

[19p-F6-9] A Study on Annealing Mechanism of Plasma-induced Si Substrate Damage (1)

^○Koji Eriguchi¹, Masanaga Fukasawa², Yoshinori Takao¹, Tetsuya Tatsumi², Kouichi Ono¹ (Kyoto Univ.¹, Sony Corp.²)

Keywords:プラズマダメージ,熱処理,欠陥