Activation energy of self-diffusion with vacancy mechanism in Si crystals

Presentation information

Oral presentation

15. Crystal Engineering » 15.8 Crystal evaluation, impurities and crystal defects

Wed. Mar 19, 2014 1:00 PM - 5:45 PM F9 (F401)

1:45 PM - 2:00 PM

^○Masashi Suezawa¹, Yoshiaki Iijima¹, Ichiro Yonenaga¹ (Tohoku Univ.,IMR¹)

Keywords:自己拡散,空孔,活性化エネルギー