The 61st JSAP Spring Meeting, 2014

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13. Semiconductors A (Silicon) » 13.2 Insulator technology

[19p-PG2-1~12] 13.2 Insulator technology

Wed. Mar 19, 2014 4:00 PM - 6:00 PM PG2 (G棟2階)

4:00 PM - 6:00 PM

[19p-PG2-3] Density Distribution of Oxide Thermally grown on Silicon Surface

○（M2）Syuhei Doi1, Mariko Hayashi1, Ryu Hasunuma1, Kikuo Yamabe1 (Tsukuba Univ.1)

Keywords:膜密度,シリコン