[19p-PG2-1~12] 13.2 Insulator technology

[19p-PG2-2] Penetration of H2O and HBr molecules into SiNx films with Si deficits

^○Tomoki Oku¹, Toshihiko Shiga¹, Masahiro Totsuka¹, Masayoshi Takemi¹ (Mitsubishi Electric Corp.¹)

Keywords:シリコン窒化膜,耐湿性,窒素ダングリングボンド