The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma measurements and diagnostics

[15a-2V-1~10] 8.2 Plasma measurements and diagnostics

Tue. Sep 15, 2015 9:00 AM - 11:30 AM 2V (234-1(South))

座長:佐々木 浩一(北大)

9:15 AM - 9:30 AM

[15a-2V-2] Vibrational and Rotational Temperature Dependence of NH in Microwave N2-H2 Mixture Gas Discharge

〇(D)HAO TAN1, Atsushi Nezu1, Hiroshi Akatsuka1 (1.Tokyo Tech.)

Keywords:N2-O2 mixture microwave discharge,NH 336-nm system,vibrational and rotational temperature

The N2-H2 mixture discharge has been investigated since over 50 years ago. Recently it become hot topics again because its widely usage in nitric processes and some industrial applications. Since low-temperature and low-pressure plasma can provide peak-resoluble spectrum, it is a very helpful method to diagnose plasmas and to investigate molecular properties. In this research, we obtained the spectra of N2-H2 mixture discharges both theoretically and experimentally.
In N2-H2 mixture discharge, N2 2nd positive system (2PS) and NH 336-nm system can be observed. The N2 2PS ranges from 300-400 nm and NH 336-nm system ranges around 336 nm, which originates from the electric transitions from N2 C 3Π to B 3Π and NH A3Π to X3Σ- molecular states.
Figure 1 shows the band spectra of N2-H2 mixture discharge. By fitting the spectra with the theoretical calculations, the vibrational and rotational temperature can be obtained. And after some analysis, we supposed two reactions that generats the NHA3Π excited state.