The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

Joint Session K » 21.1 Joint Session K

[15p-1B-1~18] 21.1 Joint Session K

Tue. Sep 15, 2015 1:15 PM - 6:00 PM 1B (133+134)

座長:浦岡 行治(奈良先端大),神谷 利夫(東工大)

3:00 PM - 3:15 PM

[15p-1B-8] Effects of impurity hydrogen on subgap defects in amorphous In-Ga-Zn-O

Haochun Tang1, 〇Toshio Kamiya1,2, Kyohei Ishikawa1, Keisuke Ide1, Hidenori Hiramatsu1, Shigenori Ueda3, Naoki Ohashi2,3, Hideya Kumomi2, Hideo Hosono1,2 (1.MSL Tokyo Tech, 2.MCES Tokyo Tech, 3.NIMS)

Keywords:amorphous oxide semiconductor,near-VBM defects,impurity hydrogen

Effects of impurity hydrogen on subgap defects in amorphous In-Ga-Zn-O are discussed. It was found that impurity hydrogen causes strong reduction reaction if no oxygen is included in the sputtering plasma, and segregate metallic In. Reduction of impurity hydrogen eliminates this effect and also reduces the optimum oxygen partial pressure.