The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

Joint Session K » 21.1 Joint Session K

[15p-1B-1~18] 21.1 Joint Session K

Tue. Sep 15, 2015 1:15 PM - 6:00 PM 1B (133+134)

座長:浦岡 行治(奈良先端大),神谷 利夫(東工大)

3:15 PM - 3:30 PM

[15p-1B-9] Microscopically-Patterned Electrochemical Doping to TiO2 Thin Films

〇Takeaki Yajima1, Tomonori Nishimura1, Akira Toriumi1 (1.The Univ. of Tokyo)

Keywords:oxide semiconductor,electrochemical doping

We demonstrated a technique of "electrochemical doping" as a convenient doping technique for oxide semiconductors. The electrochemical doping was applied to a typical oxide semiconductor TiO2, showing the control of carier density, characterization of doping depth, and microscopic patterning of dopant distribution.