[16p-2D-1~14] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[16p-2D-4] Water Exhaust Design for Batch-type Silicon Wafer Wet Cleaner

Nobutaka Ono¹, 〇shogo okuyama¹, Kento Miyazaki¹, Hitoshi Habuka¹, Akihiro Goto² (1.Yokohama Nat. Univ., 2.Pre-Tech)

Keywords:Silicon wafer,Wet cleaning,Water flow

As an extension of our previous study, which developed the water injection nozzle for the batch-type silicon wafer wet cleaner, the exhaust design for achieving a one-way water flow was studied, in this study. The water could be simultaneously exhausted from the top wall (overflow) and the side wall through the small exhaust hall set near the top of the cleaner side wall,