The 62nd JSAP Spring Meeting, 2015

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8 Plasma Electronics » 8.4 Plasma etching

[14a-A27-1~15] 8.4 Plasma etching

Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)

11:30 AM - 11:45 AM

△ [14a-A27-10] Plane Orientation Dependence of Plasma-induced Si Substrate Damage Assigned by Optical Indices

〇(B)Yukimasa Okada1, Koji Eriguchi1, Kouichi Ono1 (1.Kyoto Univ.)

Keywords:plasma-induced damage