[14a-A27-1~15] 8.4 Plasma etching

△ [14a-A27-12] Microwave Annealing of Plasma-Induced Defect Structures near Si Substrate Surface

〇Takaaki Iwai¹, Koji Eriguchi³, Shohei Yamauchi², Naotaka Noro¹, Junichi Kitagawa¹, Kouichi Ono³ (1.Tokyo Electron Yamanashi Ltd., 2.Tokyo Electron Ltd., 3.Kyoto Univ.)

Keywords:silicon,microwave annealing,plasma-induced damage