Effects of hydrogen radicals on etching reactions of transparent conducting oxides

Presentation information

Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)

9:15 AM - 9:30 AM

〇Hu Li¹, Kazuhiro Karahashi¹, Masanaga Fukasawa², Nagahata Kazunori², Tatsumi Tetsuya², Hamaguchi Satoshi¹ (1.Osaka Univ., 2.Sony Corporation)

Keywords:transparent conducting oxides,etching