[14a-A27-1~15] 8.4 Plasma etching

▲ [14a-A27-3] InGaAs quantum dot fabrication by a top-down approach for optical devices applications: effect of nanoscale etching mask

〇Cedric Thomas^{1, 4}, Chang-Yong Lee¹, Akio Higo², Naofumi Okamoto³, Ichiro Yamashita^{3, 4}, Seiji Samukawa^{1, 2, 4} (1.Tohoku Univ., 2.WPI-AIMR, Tohoku Univ., 3.Nara Inst. of Info. and Technol., 4.JST-CREST)

Keywords:Neutral beam,InGaAs,bio-nano-process