[14a-A27-1~15] 8.4 Plasma etching

△ [14a-A27-4] Dependence of Sidewall Protection for Organic film on Wafer Temperature

〇Yusuke Fukunaga¹, Takayoshi Tsutsumi¹, Keigo Takeda¹, Kenji Ishikawa¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:etching,wafer temperature,organic film