The 62nd JSAP Spring Meeting, 2015

Presentation information

Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

[14a-A27-1~15] 8.4 Plasma etching

Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)

10:15 AM - 10:30 AM

[14a-A27-6] Mechanism of transition metal etching process using neutral beam oxidation and complex reaction (2)

〇Tomohiro Kubota1, Yoshiyuki Kikuchi1, Seiji Samukawa1, 2 (1.IFS, Tohoku Univ., 2.WPI-AIMR, Tohoku Univ.)

Keywords:etching of magnetic material,first-principles theoretical calculation,transition metal complex