[14a-A27-1~15] 8.4 Plasma etching

[14a-A27-7] Surface Rippling by Oblique Ion Incidence during Plasma Etching of Silicon: Experiments with Sheath Control Plates

〇(D)Nobuya Nakazaki¹, Soma Sonobe¹, Takumi Hatsuse¹, Haruka Matsumoto¹, Koji Eriguchi¹, Kouichi Ono¹ (1.Kyoto Univ.)

Keywords:plasma etching,oblique ion incidence,surface rippling