10:45 AM - 11:00 AM
[14a-A27-8] Analysis of Surface Roughness during Si Etching in Cl2 Plasmas: Effects of Initial Surface Roughness
Keywords:etching
Oral presentation
8 Plasma Electronics » 8.4 Plasma etching
Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)
10:45 AM - 11:00 AM
Keywords:etching