The 62nd JSAP Spring Meeting, 2015

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8 Plasma Electronics » 8.4 Plasma etching

[14a-A27-1~15] 8.4 Plasma etching

Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)

10:45 AM - 11:00 AM

[14a-A27-8] Analysis of Surface Roughness during Si Etching in Cl2 Plasmas: Effects of Initial Surface Roughness

〇(M1)haruka matsumoto1 (1.Kyoto Univ.)

Keywords:etching