The 62nd JSAP Spring Meeting, 2015

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8 Plasma Electronics » 8.4 Plasma etching

[14a-A27-1~15] 8.4 Plasma etching

Sat. Mar 14, 2015 9:00 AM - 1:00 PM A27 (6A-202)

11:15 AM - 11:30 AM

[14a-A27-9] Analysis of H2 and He Plasma-induced Damage Structures by 1/C2 Method

〇Koji Eriguchi1, Masanaga Fukasawa2, Kazunori Nagahata2, Tetsuya Tatsumi2, Kouichi Ono1 (1.Kyoto Univ., 2.Sony Corp.)

Keywords:plasma,defect,anneal