Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[15a-B7-1~14] 8.1 Plasma production and control

Thu. Sep 15, 2016 9:00 AM - 12:30 PM B7 (Exhibition Hall)

Tatsuya Misawa(Saga Univ.), Tatsuo Ishijima(Kanazawa Univ.)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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9:00 AM - 9:15 AM

△ [15a-B7-1] Microwave-Excited Pure N₂ Line Plasma Production under Atmospheric Pressure Using a Modified Waveguide Structure

〇Haruka Suzuki¹, Yuto Tamura¹, Hitoshi Itoh^1,2, Makoto Sekine¹, Masaru Hori¹, Hirotaka Toyoda¹ (1.Nagoya Univ., 2.Tokyo Electron Ltd.)

9:15 AM - 9:30 AM

[15a-B7-2] Time Resolved Optical Emission Spectroscopic Measurements in Microwave Excited Water Plasma during Ashing Process

〇TAKUYA KITANO¹, HIROAKI SUZUKI¹, ARUFUA SHIOTA¹, TATSUO ISHIJIMA¹, YASUNORI TANAKA¹, YOSHIHIKO UESUGI¹ (1.Kanazawa Univ.)

9:30 AM - 9:45 AM

△ [15a-B7-3] Numerical Analysis of a micro ECR plasma thruster using Magnetic Nozzle

〇(D)keisuke ueno¹, Daisuke Mori¹, Yoshinori Takao¹, Koji Eriguchi¹, Kouichi Ono¹ (1.Kyoto Univ.)

9:45 AM - 10:00 AM

[15a-B7-4] Investigation of density distribution and reaction path in atmospheric pressure
helium/water vapar dc glow discharge

〇Kouta Okamura¹, Satoshi Uchida¹, Fumiyoshi Tochikubo¹ (1.TokyoMetro Univ.)

10:00 AM - 10:15 AM

△ [15a-B7-5] Microwave Plasma Generation Using Cylindrical Cavity and Solid-State Amplifier Ⅲ

〇(M2)Yuichi Hasegawa¹, Daisuke Ogawa¹, Keiji Nakamura¹, Soonam Park², Satoru Kobayashi², Hideo Sugai³ (1.Chubu Univ., 2.Applied Materials, 3.NISRI)

10:15 AM - 10:30 AM

[15a-B7-6] Efficient second-harmonic generation by microwave plasma with metamaterial effect (Ⅴ)

〇Akinori Iwai¹, Yoshihiro Nakamura¹, Osamu Sakai² (1.Kyoto Univ., 2.Univ. Shiga Pref.)

10:30 AM - 10:45 AM

[15a-B7-7] Development of an Electrostatic Accelerator for Laser-Ablation Plasma

〇Yuuki Nakamura¹, Haruhito Kato¹, Hideyuki Horisawa¹ (1.Tokai Univ.)

10:45 AM - 11:00 AM

[15a-B7-8] Scanning of Thermal-Plasma-Jet by Alternating Magnetic Field and Its Application to Semiconductor Substrate Annealing

〇Kenji Teramoto¹, Hiroaki Hanafusa¹, Seiichiro Higashi¹ (1.Hiroshima Univ.)

11:00 AM - 11:15 AM

[15a-B7-9] Magnetic-Mirror Confined ECR Plasma Source Using Permanent Magnets

〇Tetsuya Goto¹, Kei-ichiro Sato², Yuki Yabuta³, Shigetoshi Sugawa¹ (1.NICHe, Tohoku Univ., 2.Kotec Co., LTD., 3.Seinan Industries Co., LTD.)

11:15 AM - 11:30 AM

[15a-B7-10] Experimental results of the Production of Highly Charged Ions with Two Frequencies are close together and are far from each other in Electron Cyclotron Resonance Heating

〇Atsushi Kitagawa¹, Racz Richard², Biri Sandor², Muramatsu Masayuki¹, Kato Yushi³ (1.NIRS, QST, 2.ATOMKI, 3.Osaka Univ.)

11:30 AM - 11:45 AM

[15a-B7-11] Development and comparison of pure iron evaporators for synthesis of iron-endohedral fullerene

〇shogo hagino¹, takuro otsuka¹, takuto watanabe¹, yuto tsuda¹, masayuki muramatsu², atsushi kitagawa², yushi kato¹ (1.Osaka Univ., 2.NIRS)

11:45 AM - 12:00 PM

[15a-B7-12] Production of ECR plasma and C₆₀ ion beam with 1.30/2.45GHz-band wireless microwaves source

〇Takuto Watanabe¹, Takuro Otuka¹, Syogo Hagino¹, Yuto Tsuda¹, Yushi Kato¹ (1.Osaka univ)

12:00 PM - 12:15 PM

[15a-B7-13] Improving electrodes for extracting miscellaneous ions beams from ECRIS

〇takuro otsuka¹, shogo hagino¹, yuto tsuda¹, takuto watanabe¹, yushi kato¹ (1.Osaka Univ.)

12:15 PM - 12:30 PM

[15a-B7-14] Effect of nitrogen on the hydrogen radical generated by inductively coupled plasma

〇(M2)Daiki Tsutsumi^1,2, Yuji Okamoto^2,3, Takamasa Ishigaki¹, Masatomo Sumiya² (1.Hosei Univ., 2.NIMS, 3.Tsukuba Univ.)

Session information

[15a-B7-1~14] 8.1 Plasma production and control

△ [15a-B7-1] Microwave-Excited Pure N₂ Line Plasma Production under Atmospheric Pressure Using a Modified Waveguide Structure

[15a-B7-2] Time Resolved Optical Emission Spectroscopic Measurements in Microwave Excited Water Plasma during Ashing Process

△ [15a-B7-3] Numerical Analysis of a micro ECR plasma thruster using Magnetic Nozzle

[15a-B7-4] Investigation of density distribution and reaction path in atmospheric pressure
helium/water vapar dc glow discharge

△ [15a-B7-5] Microwave Plasma Generation Using Cylindrical Cavity and Solid-State Amplifier Ⅲ

[15a-B7-6] Efficient second-harmonic generation by microwave plasma with metamaterial effect (Ⅴ)

[15a-B7-7] Development of an Electrostatic Accelerator for Laser-Ablation Plasma

[15a-B7-8] Scanning of Thermal-Plasma-Jet by Alternating Magnetic Field and Its Application to Semiconductor Substrate Annealing

[15a-B7-9] Magnetic-Mirror Confined ECR Plasma Source Using Permanent Magnets

[15a-B7-10] Experimental results of the Production of Highly Charged Ions with Two Frequencies are close together and are far from each other in Electron Cyclotron Resonance Heating

[15a-B7-11] Development and comparison of pure iron evaporators for synthesis of iron-endohedral fullerene

[15a-B7-12] Production of ECR plasma and C₆₀ ion beam with 1.30/2.45GHz-band wireless microwaves source

[15a-B7-13] Improving electrodes for extracting miscellaneous ions beams from ECRIS

[15a-B7-14] Effect of nitrogen on the hydrogen radical generated by inductively coupled plasma

Authentication

Session information

[15a-B7-1~14] 8.1 Plasma production and control

△ [15a-B7-1] Microwave-Excited Pure N2 Line Plasma Production under Atmospheric Pressure Using a Modified Waveguide Structure

△ [15a-B7-3] Numerical Analysis of a micro ECR plasma thruster using Magnetic Nozzle

△ [15a-B7-5] Microwave Plasma Generation Using Cylindrical Cavity and Solid-State Amplifier Ⅲ

Authentication

△ [15a-B7-1] Microwave-Excited Pure N₂ Line Plasma Production under Atmospheric Pressure Using a Modified Waveguide Structure