Structural analyses on the outermost surface of Si etched in Ar/CF<sub>4</sub> plasmas

Presentation information

Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

Tue. Sep 13, 2016 9:00 AM - 11:45 AM B9 (Exhibition Hall)

10:00 AM - 10:15 AM

〇(M1)Gento Kuroda¹, Kazuo Takahashi¹, Koji Nishio¹ (1.Kyoto Institute of Technology)

Keywords:Etching, Transmission Electron Microscope