Systematic Study of the Response of Resist Materials Based on Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties to Electron Beam Irradiation

Hiroki Yamamoto; Hiroto Kudo; Kozawa Takahiro

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[13a-D61-1~12] 7.3 Micro/Nano patterning and fabrication

Tue. Sep 13, 2016 9:00 AM - 12:15 PM D61 (Bandaijima Bldg.)

Toshiyuki Horiuchi(Tokyo Denki Univ.), Yoshihiko Hirai(Osaka Pref. Univ.), Jun Taniguchi(Tokyo Univ. of Sci.), Hiroaki Oizumi(GIGAPHOTON)

9:30 AM - 9:45 AM

[13a-D61-3] Systematic Study of the Response of Resist Materials Based on Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties to Electron Beam Irradiation

〇Hiroki Yamamoto¹, Hiroto Kudo², Kozawa Takahiro¹ (1.ISIR, Osaka Univ., 2.Kansai Univ.)

Keywords:electron beam, molecular resists, chemically amplified resists

In this study, we synthesized positive-tone chemically amplified molecular resist materials modified with various ratios of cyclohexyl vinyl ether based on noria. Also, their performances as positive-tone electron beam (EB) resist materials were investigated. The physical properties of the noria-CHVEs with various protection ratios of CHVE groups were examined, and their patterning properties were also investigated using an EB exposure tool.