[15a-A26-1~11] 6.2 Carbon-based thin films

[15a-A26-6] Characteristics of Carbon nitride film fabricated by reactive sputtering method

〇Shunpei Ota¹, Kazushi Fuse¹, Yusuke Miyaguchi¹, Hyung-Woo Ahn¹, Takehito Jimbo¹ (1.ISET, ULVAC, Inc.)

Keywords:carbon nitride, reactive sputtering, semiconductor

In this presentation, for application to the semiconductor field, we will report the results of characteristics and In-plane distribution of carbon nitride film (; using reactive sputtering, 300mm Si Sub)