The 77th JSAP Autumn Meeting, 2016

Presentation information

Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[15a-B2-1~8] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

Thu. Sep 15, 2016 10:00 AM - 12:15 PM B2 (Exhibition Hall)

Kenta Arima(Osaka Univ.)

10:15 AM - 10:30 AM

[15a-B2-2] Water Nozzle Design for Batch-type Silicon Wafer Wet Cleaning Bath

shogo okuyama1, Kento Miyazaki1, Nobutaka Ono1, Hitoshi Habuka1, Akihiro Goto2 (1.Yokohama Nat. Univ., 2.Pre-Tech)

Keywords:Wet cleaning bath, Water injection nozzle, Water flow design

The water injection nozzle for the silicon wafer wet cleaning bath was designed, in order to achieve the water velosity distribution along the nozzle. The water nozzle in which the simple-designed inner tube was designed by the numerical calculation and verifid by the water flow visualization.