Symposium
Symposium » Gas Flow Analysis in Vacuum and Low-Pressure Processing
Sun. Mar 20, 2016 2:00 PM - 5:30 PM W621 (W6)
Ken Nakamura(AIST), Yoshihiko Moriyama(Toshiba Corporation)
2:00 PM - 2:15 PM
〇Hajime Yoshida1, Akiko Itakura2 (1.AIST, 2.NIMS)
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2:15 PM - 2:45 PM
〇Namio Matuda1 (1.Tokyo Denki Univ.)
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2:45 PM - 3:15 PM
〇Yasunori Tanimoto1 (1.KEK)
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3:15 PM - 3:45 PM
〇Yasunobu Akiyama1 (1.Tokai Univ.)
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4:00 PM - 4:30 PM
〇Takao Wada1, Kazuhiro Sahashi1, Akemi Shioya1 (1.Wave Front Co., Ltd.)
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4:30 PM - 5:00 PM
〇Fumihiko Matsunaga1 (1.PEGASUS Software)
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5:00 PM - 5:30 PM
〇Shuichi Tajiri1, Takanori Onishi1, Yukiko Okano1, Soichi Ogawa2, Hiroshi Mima3 (1.Okano Works,LTD., 2.Ogawa Creation Research Lab., 3.Osaka City Univ.)
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