[19a-S423-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19a-S423-8] Half-Inch Silicon CVD Reactor Using Concentrated Infrared Light Heater (6)

〇NING LI¹, HITOSHI HABUKA¹, TAKANORI MIKAHARA², SHIN-ICHI IKEDA^2,3, YUUKI ISHIDA^2,3, SHIRO HARA^2,3 (1.Yokohama National Univ., 2.MINIMAL, 3.AIST)

Keywords:minimal manufacturing,CVD,silicon

To improve the surface morphology of the epitaxial film at high temperature using the CVD reactor for minimal manufacturing, we set a cooling outside of the quartz tube because it can suppress the as phase reaction and maintained it at the mirror surface.