The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[19p-S224-1~17] 7.3 Micro/Nano patterning and fabrication

Sat. Mar 19, 2016 1:30 PM - 6:00 PM S224 (S2)

Makoto Okada(Univ. of Hyogo), Atsushi Yokoo(NTT)

5:30 PM - 5:45 PM

[19p-S224-16] Fabrication of through-hole membranes by laser drilling for discharging UV-curable liquids in UV nanoimprint lithography

Kento Seki1, Kazuro Nagase2, Nobuya Hiroshiba1, Masaru Nakagawa1, Takahiro Nakamura1 (1.IMRAM Tohoku Univ., 2.Mino Group Corp.)

Keywords:laser drilling,UV nanoimprint lithography,screen printing

In this study, we demonstrate that through-hole membranes were fabricated by picosecond pulsed laser drilling for discharging UV-curable liquids in UV nanoimprint lithography (UV-NIL). In comparison with a spincoated resin film with a uniform thickness on a Si substrate, resin droplets on the substrate were effective in leveling residual layer thickness (RLT) in contact with a mold with various pattern densities. However, viscosities of UV-curable liquids for widely used inkjet method are limited to about 10 mPa s. In our group, we have demonstrated that the UV-curable liquid, NL-SK1 mainly comprising glycerol 1,3-diglycerolate diacrylate (GDD) with high viscosity (12,800 mPa s), was placed on the substrate using a screen printing method. It is suggested that screen printing method is suitable to keep RLT uniform in UV-NIL. In the present study, through-hole membranes were prepared by picosecond laser drilling on a polyimide (PI) film with excellent mechanical and chemical properties for discharging individual UV-curable liquid droplets with a certain volume.