The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19p-S423-1~17] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Sat. Mar 19, 2016 1:45 PM - 6:15 PM S423 (S4)

Tomoji Nakamura(Fujitsu Lab.), Kuniyuki Kakushima(Titech)

6:00 PM - 6:15 PM

[19p-S423-17] Development of Ultra Accelerated Quantum Chemical Molecular Dynamics Method and Its Application to Semiconductor Process

Kenji Inaba1, Emi Sato1, Manami Sato1, Yukiko Obara1, Yukie Ishizawa1, Masayuki Miyano1, Ryuji Miura1, Patrick Bonnaud1, Ai Suzuki1, Naoto Miyamoto1, Nozomu Hatakeyama1, Masanori Hariyama1, Akira Miyamoto1 (1.Tohoku Univ.)

Keywords:Quantum chemical molecular dynamics,First principle computation,Artificial Intelligence

We have developed Ultra Accelerated quantum chemical molecular dynamics method. This method uses parameters that can reproduce the DFT.However, the parameters fitting for the giant of the model and the complex has become difficult. Therefore, we considered a method to create parameters using artificial intelligence. We have studied this method as an example a silicon oxidation.