[19p-S423-1~17] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19p-S423-7] Precise Control of the Nickelidation Process of Si Nanowire by Ar⁺ Ion Irradiation

〇(B)Shunsuke Oba¹, Shuichiro Hashimoto¹, Kohei Takei¹, Jing Sun¹, Xu Zhang¹, Taiyu Xu¹, Shuhei Asada¹, Toshihiro Usuda¹, Kiyoshi Endo¹, Motohiro Tomita^1,2,3, Hiroki Tokutake³, Ryosuke Imai³, Atsushi Ogura³, Takashi Matsukawa⁴, Meishoku Masahara⁴, Takanobu Watanabe¹ (1.Waseda Univ., 2.JSPS PD, 3.Meiji Univ., 4.AIST)

Keywords:Silicide,nanowire