[19p-W621-1~12] 8.4 Plasma etching

[19p-W621-10] Electronic properties and dissociation channels of C₄F₆ molecule

〇Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:semiconductor,etching,C4F6

CF₄, C₂F₆, C₃F₈, c-C₄F₈, c-C₅F₈ and others have been used in dielectric film etching. Recently, C₄F₆ gas is also used. The dissociation properties of CF₄, c-C₄F₈, and c-C₅F₈ gases were presented by us. Therefore, we will report the dissociation properties of C₄F₆ gas, using computational chemistry.