The 63rd JSAP Spring Meeting, 2016

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Oral presentation

8 Plasma Electronics » 8.4 Plasma etching

[19p-W621-1~12] 8.4 Plasma etching

Sat. Mar 19, 2016 2:30 PM - 5:45 PM W621 (W6)

Hisataka Hayashi(TOSHIBA), Koji Eriguchi(Kyoto Univ.)

3:15 PM - 3:30 PM

[19p-W621-4] An electrical evaluation technique for plasma-induced interlayer dielectric damage

〇(M1)Kentaro Nishida1, Yukimasa Okada1, Yoshinori Takao2, Koji Eriguchi1, Kouichi Ono1 (1.Kyoto Univ., 2.Yokohama National Univ.)

Keywords:Plasma damage,Capacitance,Interlayer dielectric