The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.8 Crystal evaluation, impurities and crystal defects

[20p-H113-1~13] 15.8 Crystal evaluation, impurities and crystal defects

Sun. Mar 20, 2016 2:15 PM - 5:45 PM H113 (H)

Koji Sueoka(Okayama Pref. Univ.), Yoshifumi Yamashita(Okayama Univ.)

4:00 PM - 4:15 PM

[20p-H113-7] Critical Stress for Generation of Slip Dislocation Developing from Scratches in Si Wafers

JUN FUJISE1, TOSHIAKI ONO1 (1.SUMCO CORPORATION)

Keywords:Silicon,dislocation,strength

For the improvement of device yield, it is important to understand the relationship between critical stress for generation of slip dislocation and scratches on silicon wafer. However, it is not clear. In this study, we reveal the relationship by three-point bending test at high temperature using silicon wafers introduced scratches intentionally.