The 63rd JSAP Spring Meeting, 2016

Presentation information

Poster presentation

13 Semiconductors » 13.2 Exploratory Materials, Physical Properties, Devices

[20p-P13-1~14] 13.2 Exploratory Materials, Physical Properties, Devices

Sun. Mar 20, 2016 4:00 PM - 6:00 PM P13 (Gymnasium)

4:00 PM - 6:00 PM

[20p-P13-1] Fabrication of high-quality Er2O3 thin film using ion beam sputter deposition method

masaya fujita1,2, Hidehito Asaoka2, Kenji Yamaguchi2 (1.Ibaraki Univ., 2.Japan Atomic Energy Agency)

Keywords:sputter etching,ion irradiation,thin film