The 63rd JSAP Spring Meeting, 2016

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13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[20p-S423-1~19] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Sun. Mar 20, 2016 1:45 PM - 6:45 PM S423 (S4)

Seiichiro Higashi(Hiroshima Univ.), Akito Hara(Tohoku Gakuin Univ.)

5:30 PM - 5:45 PM

△ [20p-S423-15] Crystallinity Evaluation Profile of Low Temperature Polycrystalline Silicon Thin Film
Using Raman Spectroscopy and Imaging

〇ryo yokogawa1, Kazuya Takahashi2, Katsuhiko Komori2, Yoshihiro Hirota3, Naomi Sawamoto1, Atsushi Ogura1 (1.Meiji Univ., 2.Tokyo Electron Tohoku Ltd., 3.Tokyo Electron Ltd.)

Keywords:low temperature polycrystalline silicon,Raman spectroscopy