The 63rd JSAP Spring Meeting, 2016

Presentation information

Print

Oral presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[20p-S423-1~19] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Sun. Mar 20, 2016 1:45 PM - 6:45 PM S423 (S4)

Seiichiro Higashi(Hiroshima Univ.), Akito Hara(Tohoku Gakuin Univ.)

6:00 PM - 6:15 PM

[20p-S423-17] Characterization of defects induced by ion implantation in germanium by DLTS

〇Hiroki Ikegaya1, Tomonori Nishimura1, Takeaki Yajima1, Akira Toriumi1 (1.The Univ. of Tokyo)

Keywords:Ge,ion implantation,DLTS