[21p-P17-1~26] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[21p-P17-5] Formation Technology Development of Strained Ge-On-Insulator (GOI)
Using SiGe Etching Stopping Layer

〇(M2)Yuuki Yajima¹, Kentaro Sawano¹ (1.TokyoCityUniversity)

Keywords:Ge On Insulator