Oral presentation
21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
Wed. Sep 6, 2017 1:45 PM - 5:45 PM C17 (Training Room 2)
Hisao Makino(Kochi Univ. of Tech.)
△：奨励賞エントリー
▲：英語発表
▼：奨励賞エントリーかつ英語発表
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1:45 PM - 2:00 PM
〇Hiroshi Yanagi1, Yusuke Koyamaishi1 (1.Univ. of Yamanashi)
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2:00 PM - 2:15 PM
〇(M2)Yumi Kondo1, Ryuitiro Ino1, Yosihiko Ninomiya1, yamada Naoomi1 (1.Chubu Univ.)
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2:15 PM - 2:30 PM
〇(D)Akane Samizo1,2, Kikuchi Naoto1, Aiura Yoshihiro1, Nishio Keishi2 (1.AIST, 2.Tokyo Univ. Sci.)
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2:30 PM - 2:45 PM
〇Takumi Ikenoue1, Masao Miyake1, Tetsuji Hirato1 (1.Kyoto Univ.)
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2:45 PM - 3:00 PM
〇Ryoya Ota1, Masaharu Nishioka1, Akira Fujimoto1, Yukiyasu Kashiwagi2, Masashi Saitoh2, Masami Nakamoto2, Yi-Kai Zhou3, Yoshiyuki Harada1, Tomosumi Kamimura1 (1.Osaka Inst of Tech., 2.ORIST, 3.Shanghai Normal Univ.)
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3:00 PM - 3:15 PM
〇Hiroki Tokunaga1, Toshihiro Miyata1, Tadatsugu Minami1 (1.Kanazawa Inst.)
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3:15 PM - 3:30 PM
〇Rei Sugiura1, Yuki Asano1, Shuhei Funaki1, Yasuji Yamada1 (1.Shimane Univ.)
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3:30 PM - 3:45 PM
〇Yuting Zhu1, Takanori Yamazaki1, Yasushi Hirose1,2, Shoichiro Nakao1,2, Tetsuya Hasegawa1,2 (1.Univ. of Tokyo, 2.KAST)
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4:00 PM - 4:15 PM
〇Naho Itagaki1, Daisuke Yamashita1, Hyunwoong Seo1, Kazunori Koga1, Masaharu Shiratani1 (1.Kyushu Univ.)
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4:15 PM - 4:30 PM
〇Tatsunori Isobe1, Akira Taki1, Masashi Senaha1, Makoto Arai1, Junya Kiyota1 (1.ULVAC)
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4:30 PM - 4:45 PM
(M2)J.-W. Peng1, (M2)Y.-K. Chang1, (D)C.-S. Hsu1, I.-C. Cheng1, J.-Y. Li1, H.-M. Chen1, C.-M. Lai2, J.-W. Lin3, W.-C. Yeh3, Y.-L. Huang3, 〇L.-H. Peng1 (1.National Taiwan Univ., 2.Ming Chuan Univ., 3.National Dong Hwa Univ.)
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4:45 PM - 5:00 PM
〇(M2)Takaya Ozawa1, Najima Hayao1, Kato Masashi1 (1.NITech)
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5:00 PM - 5:15 PM
〇Takashi Ehara1 (1.Ishinomaki Senshu Univ.)
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5:15 PM - 5:30 PM
〇Tomoyuki Kawashima1, Katsuyoshi Washio1 (1.Tohoku Univ.)
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5:30 PM - 5:45 PM
〇Hiroki Mito1, Wataru Kuwagata1, Kazuto Koike1, Yoshiyuki Harada1, Mitsuaki Yano1, Katsuhiko Inaba2, Shintaro Kobayashi2 (1.Osaka Inst. of Tech., NMRC, 2.Rigaku Corp., X-Ray Res. Lab.)
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